Overview
Intel has moved from experimentation to limited production use of ASML’s next-generation High NA extreme ultraviolet (EUV) lithography system for parts of its Panther Lake laptop processors, ASML said on Tuesday. The initiative follows trials that began in 2024 and represents a step toward operational experience with the new equipment.
What Intel is doing and why
The chipmaker is employing the High NA tool for specific layers in the Panther Lake chips. Using the equipment on targeted portions of the design will enable Intel and ASML to collect operational data and fine-tune how the tool is integrated into the manufacturing flow.
Intel fabricates Panther Lake processors on its 18A manufacturing node and already uses ASML’s standard EUV machines for much of the lithography work. The High NA system prints circuit patterns onto wafers in a similar fashion, but at a higher numerical aperture intended for smaller, tighter features.
Costs and technical considerations
The High NA equipment carries a substantial price tag, at about $400 million per tool, roughly double the cost of a standard EUV machine. Beyond the purchase price, the tool is described as technically challenging to introduce into production processes, a factor that has contributed to industry debate over the appropriate timing for broader deployment.
Deployment history and corporate response
Intel received its first High NA tool in 2024 at its research and development site in Hillsboro, Oregon, where the company works on new manufacturing techniques and process technologies. ASML’s statement confirms the progression from R&D experiments to selective production use. Intel declined to comment on the announcement.
Market signals
Reported trading movement around the announcement included shares of Intel (INTC) up about 4.5% and ASML up roughly 2.87% at the time cited.
The move is intended to build operational knowledge and optimization data rather than signal immediate, full-scale deployment of the High NA platform across Intel’s fabs.