Press Releases September 29, 2026 04:05 PM

Applied Materials and KIOXIA Partner at the EPIC Center to Advance Next-Generation Memory Technology

Applied Materials and KIOXIA Collaborate at EPIC Center to Propel Next-Gen AI Memory Technologies

By Leila Farooq
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Applied Materials has announced a strategic partnership with KIOXIA Corporation to collaboratively develop advanced memory technologies, including new memory cell structures, multi-chip stacking, and materials engineering aimed at enhancing AI memory performance. This collaboration takes place at Applied Materials' newly established EPIC Center in Silicon Valley, a $5 billion investment designed to accelerate semiconductor equipment R&D and commercialization. The partnership seeks to address critical challenges in memory density, bandwidth, and energy efficiency for AI applications.

Applied Materials and KIOXIA Partner at the EPIC Center to Advance Next-Generation Memory Technology
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Key Points

  • Applied Materials and KIOXIA join forces at the EPIC Center to innovate next-generation memory architectures and multi-chip stacking technologies.
  • The EPIC Center represents the largest U.S. investment in semiconductor equipment R&D, aiming to fast-track the commercialization of advanced materials and manufacturing processes.
  • The partnership focuses on boosting memory density, bandwidth, and energy efficiency critical for AI infrastructure, impacting semiconductor and AI hardware sectors.
  • Companies will collaborate to develop advanced memory structures, chip stacking technologies and materials engineering innovations to increase AI memory performance
  • KIOXIA joins Applied Materials’ growing EPIC Center ecosystem, which includes chipmakers, chip designers, equipment partners and universities

SANTA CLARA, Calif., Sept. 29, 2026 (GLOBE NEWSWIRE) -- Applied Materials, Inc., the leader in materials engineering solutions for the semiconductor industry, today announced that KIOXIA Corporation, a leading global supplier of flash memory and solid state drives (SSDs), will join Applied’s EPIC Center in Silicon Valley as an innovation partner to advance next-generation memory technologies. The companies will work together at the EPIC Center on advanced memory-cell and structure creation, multi-chip stacking architectures, and new materials engineering approaches designed to increase memory density and performance for the AI era.

“AI infrastructure requires memory solutions that can deliver dramatically higher density, greater bandwidth and improved energy efficiency,” said Gary Dickerson, President and CEO of Applied Materials. “By bringing KIOXIA’s deep expertise in memory technology together with Applied’s materials engineering innovations at the EPIC Center, we’re creating a powerful partnership to define what’s possible in next-generation memory.”

“At KIOXIA, we have always believed that the possibility of memory is defined by the ability to stretch the boundaries of materials and process innovation,” said Hiroo Ota, President and CEO of KIOXIA Corporation. “Our collaboration with Applied Materials reflects our shared commitment to driving memory innovation, and we are excited to partner at the EPIC Center to achieve advanced breakthroughs.”

Through the EPIC Center partnership, Applied Materials and KIOXIA will collaborate on R&D initiatives focused on the most critical challenges in next-generation memory innovation. Areas of focus include:

  • Advanced memory cell and structure creation to develop more capable, higher-density memory architectures for AI applications
  • Multi-chip stacking for next-generation memory to enable chip integration that increases memory density and performance within constrained form factors
  • Advanced packaging for stacked memory to improve integration and interconnect performance in complex multi-die memory solutions
  • Materials engineering innovations that enable next-generation memory structures while supporting manufacturability at scale

“Memory is at the center of the AI innovation roadmap, and the challenges of increasing memory density while managing cost and complexity require breakthroughs across materials, equipment and process technology,” said Dr. Prabu Raja, President of the Semiconductor Products Group at Applied Materials. “We look forward to partnering with KIOXIA at the EPIC Center, where our teams will drive advances in AI memory through deep co-innovation.”

“Partnering with Applied Materials at the EPIC Center gives us a unique environment to tackle the hardest challenges in next-generation memory,” said Minori Kajimoto, General Manager of Advanced Memory Development at KIOXIA. “By having top innovators from KIOXIA and Applied Materials working side by side, we aim to accelerate the commercialization of breakthroughs in memory and packaging technologies that achieve new levels of integration and performance for AI computing.”

Applied’s new, $5 billion* EPIC (Equipment and Process Innovation and Commercialization) Center in Silicon Valley represents the largest-ever U.S. investment in advanced semiconductor equipment R&D. The center, which will be operationally ready this year, is designed from the ground up to dramatically reduce the time it takes to commercialize breakthrough technologies from early-stage research to full-scale manufacturing. For chipmakers, the EPIC Center will provide earlier access to Applied’s R&D portfolio, faster cycles of learning and accelerated transfer of next-generation technologies into high-volume manufacturing, within a secure collaborative environment. In addition, the co-innovation programs at the EPIC Center will provide Applied with greater multi-node visibility to guide R&D investments while increasing R&D productivity and value sharing.

*Capital spending is expected to scale over time to approximately $5 billion as customer projects commence.

Forward-Looking Statements
This press release contains forward-looking statements, including those regarding Applied’s investment and growth strategies, the development of new materials and technologies, industry outlook and technology requirements, the plans and expectations for the EPIC Center, and other statements that are not historical facts. These statements and their underlying assumptions are subject to risks and uncertainties and are not guarantees of future performance. Factors that could cause actual results to differ materially from those expressed or implied by such statements include, without limitation: the demand for semiconductors and customers’ technology requirements; the ability to develop new and innovative technologies; the ability to obtain and protect intellectual property rights in key technologies; the ability to achieve the objectives of the EPIC Center; and other risks and uncertainties described in Applied’s filings with the Securities and Exchange Commission, including Applied’s most recent Forms 10-K, 10-Q and 8-K. All forward-looking statements are based on management’s current estimates, projections and assumptions, and Applied assumes no obligation to update them.

About Applied Materials
Applied Materials, Inc. (Nasdaq: AMAT) is the leader in materials engineering solutions that are at the foundation of virtually every new semiconductor and advanced display in the world. The technology we create is essential to advancing AI and accelerating the commercialization of next-generation chips. At Applied, we push the boundaries of science and engineering to deliver material innovation that changes the world. Learn more at www.appliedmaterials.com.

Contacts:

Applied Materials
Ricky Gradwohl (editorial/media) 408.235.4676
Mike Sullivan (financial community) 408.986.7977


Risks

  • Uncertainties remain regarding the development and commercialization timeline of breakthrough memory technologies, which may impact competitive positioning.
  • Demand fluctuations in the semiconductor market and shifting technology requirements could affect the success of these innovations.
  • Intellectual property protection and achieving the EPIC Center's objectives present risks that could influence Applied Materials' R&D outcomes.

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